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TY - CONF AU - Gofron, K.J. AU - Cai, Y.Q. AU - Coburn, D.S. AU - Suvorov, A. ED - Schaa, Volker RW ED - Götz, Andy ED - Venter, Johan ED - White, Karen ED - Robichon, Marie ED - Rowland, Vivienne TI - Temperature Control of Crystal Optics for Ultrahigh-Resolution Applications J2 - Proc. of ICALEPCS2023, Cape Town, South Africa, 09-13 October 2023 CY - Cape Town, South Africa T2 - International Conference on Accelerator and Large Experimental Physics Control Systems T3 - 19 LA - english AB - The temperature control of crystal optics is critical for ultrahigh resolution applications such as those used in meV-resolved Inelastic Scattering. Due to the low count rate and long acquisition time of these experiments, for 1-meV energy resolution, the absolute temperature stability of the crystal optics must be maintained below 4 mK to ensure the required stability of lattice constant, thereby ensuring the energy stability of the optics. Furthermore, the temperature control with sub-mK precision enables setting the absolute temperature of individual crystal, making it possible to align the reflection energy of each crystal’s rocking curve in sub-meV resolution thereby maximizing the combined efficiency of the crystal optics. In this contribution, we report the details of an EPICS control system using PT1000 sensors, Keithley 3706A 7.5 digits sensor scanner, and Wiener MPOD LV power supply for the analyzer crystals of the Inelastic X-ray Scattering (IXS) beamline 10-ID at NSLS-II. We were able to achieve absolute temperature stability below 1 mK and sub-meV energy alignment for several asymmetrically cut analyzer crystals. The EPICS ePID record was used for the control of the power supplies based on the PT1000 sensor input that was read with 7.5 digits accuracy from the Keithley 3706A scanner. The system enhances the performance of the meV-resolved IXS spectrometer with currently a 1.4 meV total energy resolution and unprecedented spectral sharpness for studies of atomic dynamics in a broad range of materials. PB - JACoW Publishing CP - Geneva, Switzerland SP - 899 EP - 902 KW - controls KW - EPICS KW - optics KW - power-supply KW - lattice DA - 2024/02 PY - 2024 SN - 2226-0358 SN - 978-3-95450-238-7 DO - doi:10.18429/JACoW-ICALEPCS2023-TUPDP132 UR - https://jacow.org/icalepcs2023/papers/tupdp132.pdf ER -